Reactive Ion Etcher (RIE) 2

Oxford, Plasmalab 80 Plus

Social Distancing Instructions: University standard policy

Used for sputter etching on non-reactive metals. Process gases include sulfur hexafluoride, oxygen and argon.

Lab: TIC Level 7 Cleanroom
Location: TIC
University of Strathclyde
Owner: Ian Watson
Contact: Ian Watson

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